We saw much more detail last week into European research consortium (they are here) IMEC’s 32 nm platform. One of the most revealing looks was into the tangle of decisions surrounding lithography for ...

The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual ...

AMSTERDAM (Reuters) -Taiwan Semiconductor Manufacturing Co (2330.TW), the world's largest contract chipmaker, is still assessing when it will use ASML's cutting-edge high numerical aperture (NA) ...

Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history. This raises a ...

Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

Intel has been in the news lately for being the first semiconductor fab to jump aboard the high numerical aperture (high-NA) fabrication train. The company is the first of the big fabs to buy a ...

Optical metasurfaces to perform optical analog spatial differentiation operations and image edge detection processing is a currently hot topic. However, some metasurface differentiators are limited by ...

Dutch company ASML has made a lot of news over the past six months by unveiling the world's first High-NA (numerical aperture) lithography machine. The cutting-edge device offers upgraded specs and ...